In the semiconductor industry, ion implantation process has expanded to a wide range of applications with doses and energies spanning several orders of magnitude. Ion implantation is a very ...

Titanium has a tendency to gall when in rubbing contact with itself and other surfaces. A number of techniques have been developed to engineer the titanium surface and overcome this problem: In the ...

Tool and die makers have always looked for the perfect solution that includes a hard and tough surface produced from easily workable but wear-resistant material. To this end, ion implantation, which ...

The feature size of silicon-based transistors is approaching the theoretical limit, which puts forward higher requirements for the “atomic level manufacturing” of semiconductors. The basic idea of ...

Form device structure using only ion implantation process without epitaxy for the cost effective mass production of high-performance SiC power semiconductors by developing ion implantation process ...